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Probing the Electron States and Metal-Insulator Transition Mechanisms in Atomically Thin MoS2 Based on Vertical Heterostructures

机译:探讨电子态和金属绝缘子过渡机制   基于垂直异质结构的原子级薄mos2

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摘要

The metal-insulator transition (MIT) is one of the remarkable electricaltransport properties of atomically thin molybdenum disulphide (MoS2). Althoughthe theory of electron-electron interactions has been used in modeling the MITphenomena in MoS2, the underlying mechanism and detailed MIT process stillremain largely unexplored. Here, we demonstrate that the verticalmetal-insulator-semiconductor (MIS) heterostructures built from atomically thinMoS2 (monolayers and multilayers) are ideal capacitor structures for probingthe electron states in MoS2. The vertical configuration of MIS heterostructuresoffers the added advantage of eliminating the influence of large impedance atthe band tails and allows the observation of fully excited electron states nearthe surface of MoS2 over a wide excitation frequency (100 Hz-1 MHz) andtemperature range (2 K- 300 K). By combining capacitance and transportmeasurements, we have observed a percolation-type MIT, driven by densityinhomogeneities of electron states, in the vertical heterostructures built frommonolayer and multilayer MoS2. In addition, the valence band of thin MoS2layers and their intrinsic properties such as thickness-dependence screeningabilities and band gap widths can be easily accessed and precisely determinedthrough the vertical heterostructures.
机译:金属绝缘体转变(MIT)是原子薄的二硫化钼(MoS2)的显着电传输特性之一。尽管在MoS2的MIT现象建模中已经使用了电子-电子相互作用的理论,但其机理和详细的MIT过程仍未得到充分探索。在这里,我们证明了由原子上薄的MoS2(单层和多层)构建的垂直金属-绝缘体-半导体(MIS)异质结构是探测MoS2中电子态的理想电容器结构。 MIS异质结构的垂直配置提供了消除带尾处大阻抗影响的附加优势,并允许在宽激发频率(100 Hz-1 MHz)和温度范围(2 K- 300 K)。通过结合电容和传输测量,我们在由单层和多层MoS2构成的垂直异质结构中观察到由电子态的密度不均匀性驱动的渗流型MIT。此外,通过垂直异质结构可以轻松访问和精确确定薄MoS2层的价带及其固有性质,例如厚度依赖性筛选能力和带隙宽度。

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